Abstract

APERADOR CHAPARRO, William; LAVERDE CATANO, Dionisio  and  VERA LOPEZ, Enrique. Electrodeposición de Cobre-Latón sobre sustratos de Zamak utilizando las técnicas DC, PDC y PRC. Rev. LatinAm. Met. Mat. [online]. 2006, vol.26, n.1-2, pp.76-84. ISSN 0255-6952.

This research shows the implementation of the techniques of inverse-pulsing current, direct-pulsing current and direct current for the electrodeposition of copper brass thin films as double-layer on Zamak substrates. The morphological analysis has been carry out by using atomic force microscopy (AFM). This technique allowed the detection of finer grain size on the films obtained by inverse-pulsing in comparison with the films obtained via the other two techniques. In order to evaluate the corrosion resistance of the thin films, EIS technique and polarization curves were employed. It was also observed that deposition by using the inverse-pulsing current technique generated deposits of minor porosity and increased the corrosion resistance of the obtained films.

Keywords : Inverse-pulsing current; Electro-deposition; EIS; Corrosion.