Abstract

LOPEZ, Roberto et al. Propiedades fotoluminiscentes de películas ZnO: A-SiO_x obtenidas por la técnica cvd asistido por filamento caliente. Rev. LatinAm. Metal. Mater. [online]. 2011, vol.31, n.1, pp.59-63. ISSN 0255-6952.

The current interest in materials consisting of more than one component, has increased in recent years due to the properties they present. In this work, we carried out a study of photoluminescent properties of ZnO: a-SiO_x composites. To obtain the material, hot filament chemical vapor deposition (HFCVD) technique was employed in a temperature range of 900-1100 °C. We include a solid source of quarts (SiO₂) in the growth environment, to study its effect on deposited films properties. Structural characterization by X-ray diffraction (XRD) and infrared spectroscopy (FTIR), indicated that the phases ZnO and a-SiO_x coexist regardless of the deposit temperature, although this parameter is decisive in the dominant photoluminescent emission phase

Keywords : ZnO; HFCVD; PL; a-SiO_x.