Abstract

ARAGON M, Juan  and  CAMUS A, Juan. EFFECT OF THE CONCENTRATION OF CHLORIDE ION IN THE STRUCTURE OF ELECTRODEPOSITS OF COPPER. Rev. LatinAm. Metal. Mater. [online]. 2011, vol.31, n.2, pp.128-133. ISSN 0255-6952.

Metallography analysis of deposits of copper obtained from acidic solutions of copper sulphate, when changing the concentration of chloride, between 20 - 50 mg/L, allows to corroborate that the deposit of coarse-grained of type "crystals that reproduce the base" (RB) initial, begins to tune it to a growth of texture oriented in the field of type FT to the powder structure or scattered structures without orientation, of type UD. Over the 50 mg/L of chloride is produced the opposite effect, grain size began to increase. To add further guar between 15 and 30 mg/L, notes that with 30 g/L of chloride, improves the quality of the deposit, which is optimized increasing current density up to 290 A/m² and temperature to the 55ºC

Keywords : Copper; electrocristalyzation; chloride; guar.